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Plasma Physics


Statistical Plasma Physics, Volume I: Basic Principles (Frontiers in Physics)

Statistical Plasma Physics, Volume I: Basic Principles (Frontiers in Physics) Lowest new price: $64.99
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Author: Setsuo Ichimaru
Brand: Brand: Westview Press

Plasma physics is an integral part of statistical physics, complete with its own basic theories. Designed as a two-volume set, Statistical Plasma Physics is intended for advanced undergraduate and beginning graduate courses on plasma and statistical physics, and as such, its presentation is self-contained and should be read without difficulty by those with backgrounds in classical mechanics, electricity and magnetism, quantum mechanics, and statistics. Major topics include: plasma phenomena in nature, kinetic equations, plasmas and dielectric media, electromagnetic properties of Vlasov plasmas in thermodynamic equilibria, transient processes, and instabilities.

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Plasma Confinement (Frontiers in Physics)

Plasma Confinement (Frontiers in Physics) Lowest new price: $51.00
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Author: James D. Meiss

Detailed and authoritative, this graduate-level text examines the essential physics underlying international research in magnetic confinement fusion. It offers readable, thorough accounts of the fundamental concepts behind methods of confining plasma at or near thermonuclear conditions. 1992 edition.

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Ionospheres: Physics, Plasma Physics, and Chemistry (Cambridge Atmospheric and Space Science Series)

Ionospheres: Physics, Plasma Physics, and Chemistry (Cambridge Atmospheric and Space Science Series) Lowest new price: $259.95
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Author: Robert W. Schunk

Ionospheres provides a comprehensive description of the physical, plasma and chemical processes controlling the behavior of ionospheres. The relevant transport equations and related coefficients are derived in detail and their applicability and limitations are described. Relevant wave processes are outlined and important ion chemical processes and reaction rates are presented. The various energy deposition and transfer mechanisms are described in some detail, and a chapter is devoted to the various processes controlling the upper atmosphere and exosphere. The second half of the book presents our current understanding of the structure, chemistry, dynamics and energetics of the terrestrial ionosphere, and other solar system bodies. The final chapter describes ionospheric measurement techniques. The book will form a comprehensive and lasting reference for scientists interested in ionospheres, and it will also prove an ideal textbook for graduate students. It contains extensive student problem sets, and an answer book is available for instructors.


Fundamentals of Plasma Physics

Fundamentals of Plasma Physics Lowest new price: $84.82
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Author: Paul M. Bellan

This rigorous explanation of plasmas is relevant to diverse plasma applications such as controlled fusion, astrophysical plasmas, solar physics, magnetospheric plasmas, and plasma thrusters. More thorough than previous texts, it exploits new powerful mathematical techniques to develop deeper insights into plasma behavior. After developing the basic plasma equations from first principles, the book explores single particle motion with particular attention to adiabatic invariance. The author then examines types of plasma waves and the issue of Landau damping. Magnetohydrodynamic equilibrium and stability are tackled with emphasis on the topological concepts of magnetic helicity and self-organization. Advanced topics follow, including magnetic reconnection, nonlinear waves, and the Fokker-Planck treatment of collisions. The book concludes by discussing unconventional plasmas such as non-neutral and dusty plasmas. Written for beginning graduate students and advanced undergraduates, this text emphasizes the fundamental principles that apply across many different contexts.

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Plasma Processing of Materials: Scientific Opportunities and Technological Challenges

Plasma Processing of Materials: Scientific Opportunities and Technological Challenges Lowest new price: $37.71
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Author: National Research Council

Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the world--electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field.
The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.


Introduction to Plasmonics: Advances and Applications

Introduction to Plasmonics: Advances and Applications Lowest new price: $75.00
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Plasmonics is a highly dynamic field, and a number of researchers and scientists from other disciplines have become involved in it. This book presents the most widely employed approaches to plasmonics and the numerous applications associated with it. There are several underlying elements in plasmonics research. Advances in nanoscience and nanotechnology have made possible the fabrication of plasmonic nanostructures, deposition of thin films, and development of highly sensitive optical characterization techniques. The different approaches to nanostructuring metals have led to a wealth of interesting optical properties and functionality via manipulation of the plasmon modes that such structures support. The sensitivity of plasmonic structures to the changes in their local dielectric environment has led to the development of new sensing strategies and systems for chemical analysis and identification. The book discusses all of these aspects.


Computer Applications in Plasma Science and Engineering (Series in Health Care for Women)

Computer Applications in Plasma Science and Engineering (Series in Health Care for Women) Lowest new price: $73.49
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This volume, which contains 15 contributions, is based on a minicourse held at the 1987 IEEE Plasma Science Meeting. The purpose of the lectures in the course was to acquaint the students with the multidisciplinary nature of computational techniques and the breadth of research areas in plasma science in which computation can address important physics and engineering design issues. These involve: electric and magnetic fields, MHD equations, chemistry, radiation, ionization etc. The contents of the contributions, written subsequent to the minicourse, stress important aspects of computer applications. They are: 1) the numerical methods used; 2) the range of applicability; 3) how the methods are actually employed in research and in the design of devices; and, as a compendium, 4) the multiplicity of approaches possible for any one problem. The materials in this book are organized by both subject and applications which display some of the richness in computational plasma physics.


The Interaction of High-Power Lasers with Plasmas (Series in Plasma Physics)

The Interaction of High-Power Lasers with Plasmas (Series in Plasma Physics) Lowest new price: $100.78
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Author: Shalom Eliezer

The Interaction of High-Power Lasers with Plasmas provides a thorough self-contained discussion of the physical processes occurring in laser-plasma interactions, including a detailed review of the relevant plasma and laser physics. The book analyzes laser absorption and propagation, electron transport, and the relevant plasma waves in detail. It also discusses the physics of the electric and magnetic fields in a laser-induced plasma medium, laser-induced shock waves, rarefaction waves, heat waves, and the related hydrodynamic instabilities (Rayleigh-Taylor, Richtmyer-Meshkov, and Kelvin-Helmholtz).

A pedagogical presentation, the book addresses the basic physics issues from first principles, using simple models wherever appropriate. The coverage provides a foundation on which the graduate student can build an understanding of the past and present research in this field. For the experienced researcher, the book is a comprehensive and useful presentation of laser-plasma interactions.


An Introduction to the Physics of Intense Charged Particle Beams

An Introduction to the Physics of Intense Charged Particle Beams Lowest new price: $178.47
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Author: R. Miller

An intense charged particle beam can be characterized as an organized charged particle flow for which the effects of beam self-fields are of major importance in describing the evolution of the flow. Research employing such beams is now a rapidly growing field with important applications ranging from the development of high power sources of coherent radiation to inertial confinement fusion. Major programs have now been established at several laboratories in the United States and Great Britain, as well as in the USSR, Japan, and several Eastern and Western European nations. In addition, related research activities are being pursued at the graduate level at several universities in the US and abroad. When the author first entered this field in 1973 there was no single reference text that provided a broad survey of the important topics, yet contained sufficient detail to be of interest to the active researcher. That situation has persisted, and this book is an attempt to fill the void. As such, the text is aimed at the graduate student, or beginning researcher; however, it contains ample information to be a convenient reference source for the advanced worker.

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Principles of Plasma Discharges and Materials Processing

Principles of Plasma Discharges and Materials Processing Lowest new price: $79.05
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Author: Michael A. Lieberman

Timely, authoritative, pedagogically consistent— a valuable professional resource and a superior didactic tool. Authored by two internationally respected pioneers in the field, this book offers a fully integrated, pedagogically consistent presentation of the fundamental physics and chemistry of partially ionized, chemically reactive, low-pressure plasmas and their roles in a wide range of plasma discharges and processes used in thin film processing applications—especially in the fabrication of integrated circuits. With many fully worked examples, practice exercises, and clear demonstrations of the relationship of plasma parameters to external control parameters and processing results, this book combines the best qualities of a student text and a professional resource.

  • In-depth coverage of the fundamentals of plasma physics and chemistry—includes separate chapters on atomic and molecular collisions
  • Applies basic theory to plasma discharges, including calculations of plasma parameters and scaling of plasma parameters with control parameters
  • Applies results to basic processing mechanisms and the effects of plasma parameters on those mechanisms
  • Uses numerous worked examples to demonstrate the relationships between control parameters, plasma parameters, and processing results


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